EUV pellicle with increased EUV light transmittance
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United States of America Patent
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May 25, 2010
Grant Date -
May 15, 2008
app pub date -
Nov 10, 2006
filing date -
Nov 10, 2006
priority date (Note) -
In Force
status (Latency Note)
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Abstract
According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle for protecting a lithographic mask includes an aerogel film. The pellicle further includes a frame for mounting the aerogel film over the lithographic mask. The aerogel film causes the pellicle to have increased EUV light transmittance.
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