Variable time etching system according to the accumulated number of devices being processed and a method for etching in the same manner
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United States of America Patent
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Dec 17, 2002
Grant Date -
Jul 11, 2002
app pub date -
Jun 22, 1999
filing date -
Sep 24, 1998
priority date (Note) -
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status (Latency Note)
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Abstract
An etching system and method. In the method, layers are etched on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, wherein an etching period varies according to an accumulated process number of substrates. The system includes an etching equipment including an etching processor for etching layers on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, and a loader for temporarily holding cassettes in which the substrates are stored; and a controller for controlling operations of the etching equipment. The etching equipment changes an etching period according to an accumulated process number of the substrates.
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