Method for stud pull test for film formed on semiconductor device

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United States of America Patent

PATENT NO 6176141
SERIAL NO

09332379

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Abstract

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A test sample with a film and an underlying substrate representing part of a semiconductor wafer is prepared for a stud pull test by a process that includes maintaining the sample in boiling salt water for a few hours. When an epoxy stud is attached to the film of the sample and the clamped assembly is baked for a about an hour, the stud is firmly attached to the film and in an otherwise conventional pull test, the film breaks loose from the substrate (or the stud breaks from the epoxy) before the stud breaks from the film.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Chung-Long Dou-Liu, TW 62 1057
Chao, Ying-Chen Hsin-Chu, TW 26 766
Chuang, Lung-Hsiang Shiao-Chia, TW 1 3
Jang, Syun-Ming Hsin-Chu, TW 381 6833

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